高功(gong)率(lv)脈衝(chong)UV雷(lei)射(she)
Key Features
Commercially available pulse energy and peak power,Tighter process control due to energy stability enabled by intracavity harmonic generatio,Capable of processing widest range of materials due to wide range of pulse energies and repetition rates,High reliability due to low fluence in harmonic crystals and no cavity optic coatings exposed to UV,355 or 532 nm outputs available
Applications
Solar cell processing,Wafer scribing,Full-cut thin wafer dicing,Low-k dielectric grooving,Micro via drilling,Micromachining of silicon and metals
CONTACT INFORMATION
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